Kuwait University
COLLEGE OF ENGINEERING & PETROLEUM

Physical Vapor Deposition System

CHA Solutions 5909

The CHA Solution is a high vacuum Physical Vapor Deposition System that is used to create high quality thin film. The system has two sources for evaporation: e-beam and resistance source. One mechanical pump is installed for rough pumping and one cryo pump for high vacuum pumping. The turret can accommodate four crucibles at a time to allow multiple and sequential evaporations. Substrates are held in a rotating dome. The deposition controller allows for automatically controlled rise and soaks of crucible melts, and tightly controlled deposition of films.

The front panel instruments and controllers are:
1. Simatic 8” Color Touchscreen
2. GP307 Vacuum Gauge Controller
3. CTI On Board Auto Regeneration Controls for Cryopump.
4. Sycon Electron Beam Power Supply
5. Quartz Crystal thickness sensor with IC5 Deposition Controller
6. Sycon EBS530 Sweep Control Power Supply

Specifications

  • Vacuum Chamber
  • Type: Water cooled stainless steel
  • Size: 18"D x 18"W x 24"H
  • Source distance: 15"
  • Systems Control Options
  • Manual: Autotech sequencer
  • PLC: Siemens touch screen
  • Vapor Source Options
  • Electron beam gun: 4 x 15cc
  • Resistance source
  • Pumping Options
  • Cyro
  • Mechanical
  • Ultimate Vacuum
  • System 10 -9 Torr
  • Chamber 10 -8 Torr


Capabilities

  • Vacuum down to 10-8 Torr
  • 4 pockets for different materials
  • Suitable for 4 inch wafer and smaller samples
  • Programmable and controllable deposition process
  • Different beam sweeping shapes
  • Manual/Auto deposition mode
  • 6 sample holders
  • Resistance source


 Applications

  • Thin film deposition
  • Material Science
  • Lift-off processes
  • Contact Metallization
  • Micro/Nano fabrication