Kuwait University
COLLEGE OF ENGINEERING & PETROLEUM

The MA4 Karl Suss mask aligner is equipment used for micro-lithography to transfer the micro electronic circuit layout onto the wafer. A mask is placed above the wafer. The mask has the desired circuit pattern on it. A high intensity ultraviolet light is placed over the mask. The light only transmits through the mask openings allowing the pattern to be transferred to photoresist.

Specification

  • pieces up to 4 inch wafers 
  • 5 inch mask holder 
  • top side alignment
  • 1um pattern resolution 
  • 1‐2um alignment accuracy
  • I-line (365 nm) optical lamp 
  • Substrates up to 6 mm thickness
  • Exposure modes: soft contact, hard contact, vacuum contact and  Low vacuum contact.


Applications

  • Micro Lithography
  • Photovoltaic
  • Semiconductor
  • Material science

Mask Aligner