Ellipsometry is an optical non destructive technique allowing the accurate characterization of thin films, surface and interface. It is mainly used to determine thin film thickness (from 1Å to 2µm) and optical constants (n,k). The Ellipsometer makes use of the fact that the polarization state of light may change when the light beam is reflected from a surface. If the surface is covered by a thin film (or a stack of films), the entire optical system of film & substrate, influences the change in polarization. The ellipsometry measures two parameters, ψ and Δ, defined as the ratio of relative amplitude and phase difference for p- and s-polarized light before and after reflecting on sample surfaces1-2. The optical and geometrical properties of thin film layers are analyzed using model fitting procedure with these measured ellipsometric parameters. It is therefore possible to deduce information about the film properties, especially the film thickness.
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